COMPACTS, WHICH ARE USED IN THE MANUFACTURE OF MICROELECTRONIC PRODUCTS. THE COMPACTS, WHICH ARE MADE OF ANTI-STATIC PLASTIC, ARE ESSENTIAL COMPONENTS USED FOR THE STORAGE OF PHOTOMASKS USED IN THE PHOTOLITHOGRAPHY PROCESS. THEY ARE DESIGNED FOR USE WITH SPECIFIC PHOTOMASKS AND ARE ESSENTIAL IN MAINTAINING THE CLEANLINESS AND QUALITY OF THE PHOTOMASK THROUGHOUT THE MANUFACTURING PROCESS.

Description of goods

GB113943189

Expired

9010901000- Related TARIC code

Issuing country

Date of issue

Feb 28, 2005

Valid from

Feb 28, 2005

Valid until

Dec 31, 2006

Place of issue

Southend

Description of goods

Classification justification

CLASSIFICATION IS DETERMINED BY THE INTERPRETATION OF GENERAL RULES 1 & 6 OF THE COMBINED NOMENCLATURE AND THE TERMS OF HEADING 9010 AND SUBHEADING 901090. NOTE 2(b) TO CHAPTER 90.

Keywords

MOULDEDOF PLASTICSEMICONDUCTOR DEVICESSEMICONDUCTOR WAFERS

GB113943189

Expired

9010901000- Related TARIC code

Issuing country

Date of issue

Feb 28, 2005

Valid from

Feb 28, 2005

Valid until

Dec 31, 2006

Place of issue

Southend

Description of goods

Classification justification

CLASSIFICATION IS DETERMINED BY THE INTERPRETATION OF GENERAL RULES 1 & 6 OF THE COMBINED NOMENCLATURE AND THE TERMS OF HEADING 9010 AND SUBHEADING 901090. NOTE 2(b) TO CHAPTER 90.

Keywords

MOULDEDOF PLASTICSEMICONDUCTOR DEVICESSEMICONDUCTOR WAFERS

See also