GBBTI5036393613923109010
A PHOTOMASK COMPACT. USED FOR THE HOUSING, STORAGE, HANDLING AND MOVEMENT OF A PHOTOMASK IN A PARTICLE FREE ENVIRONMENT INSIDE A PHOTOLITHOGRAPHY OR SEMICONDUCTOR FABRICATION FACILITY. MADE OF BLENDED THERMOPLASTICS PROVIDING SPECIAL ELECTROSTATIC DISCHARGE (ESD) AND OUTGASSING PROPERTIES. MATERIALS INCLUDE BUT ARE NOT LIMITED TO; CARBON FILLED POLYCARBONATE, ACRYLONITRILE BUTADIENE STYRENE (ABS) AND POLYPROPYLENE EACH HAVING NONPOROUS, ABRASION RESISTANT OR IMPACT RESISTANT SURFACE PROPERTIES. COMPACT CONTAINS SPECIALLY DESIGNED RETAINER SYSTEM TO PROTECT THE PHOTOMASK FROM SURFACE OR COSMETIC DAMAGE AND IS AVAILABLE EITHER WITH OR WITHOUT A GASKET SEAL.