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A VACUUM ELEVATOR, USED IN THE DELIVERY SYSTEM OF A PLASMA ETCHING DEVICE FOR THE PRODUCTION OF SILICON WAFERS. THE ELEVATOR TRANSPORTS WAFERS FRP, 4 TO 12 INCHES FROM THE CASETTE WHERE THE WAFERS ARE STORED, TO THE PROCESSING AREA BY WAY OF VACUUM ELEVATION. ANY TYPE OF MATERIAL CAN BE HANDLED INCLUDING SILICON, GALLIUM ARSENIDE AND FLAT PANEL DISPLAYS. ADDITIONAL FEATURES: PRECISE TO 0.001 INCH; VACUUM COMPATIBLE; ZERO BACKLASH; STAINLESS STEEL BELLOWS SEAL; FAST 1 INCH PER SECOND SPEED; DRIVE TO ANY POSITION; SERIAL PORT FOR EXTERNAL CONTROL.

CLEAN KIT FOR SPUTTERING MACHINE. THE KIT IS COMPRISED OF THE FOLLOWING COMPONENTS: A LOWER SHIELD, INNER SHIELD, UPPER SHIELD, COVER RING, DEPOSITION RING, SHUTTER DISK, INNER SHIELD CLAMP AND LOWER SHIELD CLAMP. THE COMPONENTS ARE STACKED/INTERMESHED ON TOP OF EACH OTHER. THEY ENCAPSULATE THE SEMICONDUCTOR WAFER FROM THE WALLS OF THE HIGH VACUUM CHAMBER OF THE SPUTTERING MACHINE, ALLOWING CONTROLLED SPUTTERING TO TAKE PLACE AND PREVENTING METAL DEPOSITION ON THE CHAMBER WALLS. THE COMPONENTS ARE PRESENTED TOGETHER, UNASSEMBLED, IN A CASE.

THIS SYSTEM IS CONFIGURED FOR ION BEAM ETCH (IBE) ONLY AND IS SUPPLIED WITH THE FOLLOWING CONFIGURATION; STAINLESS STEEL PROCESS CHAMBER WITH EXCHANGEABLE LINERS SYSTEM CONSOLE WATER COOLED SUBSTRATE HOLDER AND HELIUM "BACKSIDE COOLING" COMPUTER CONTROL ION SOURCE / OPTICS VACUUM MEASUREMENT GAS SUPPLY PUMPING SYSTEM TRANSFER STATION VACUUM CASSETTE STATION SIMS. THE SYSTEM IS CONFIGURED TO PERFORM THE FOLLOWING PROCESSES: ETCHING OF SIO2, AU, CR, RU, TI, PT, CU, TIW, CO, AG, NI, TINI, TA, AL2O3, TAN, PD, CAF2, FE, MGO, PZT, IEMN, CUN, NIFE, CR2O3 & CMT AND IS CONFIGURED FOR THE ETCHING OF NEW TYPES OF SENSORS INCLUDING FORCE AND PRESSURE SENSORS. FOR MEDICAL AND SCIENTIFIC APPLICATIONS.

PELLICLE. THIS PRODUCT IS USED IN THE SEMICONDUCTOR INDUSTRY TO PROTECT THE SURFACE OF A PHOTOMASK FROM LOOSE PARTICULATE. IT CONSISTS OF AN ANODISED ALUMINIUM FRAME WITH A SUBMICRON CELLULOSE OR FLUROPOLYMER MEMBRANE. IT IS ATTACHED TO THE PHOTOMASK WITH PRE-ADDITIVE ADHESIVE USING A PRESSURISED PELLICLE MOUNTING TOOL. THEY ARE IMPORTED PACKAGED IN BESPOKE TWO PART MOULDED CASES MADE FROM SOFT OR HARD PLASTIC.

PELLICLE. THIS PRODUCT IS USED IN THE SEMICONDUCTOR INDUSTRY TO PROTECT THE SURFACE OF A PHOTOMASK FROM LOOSE PARTICULATE. IT CONSISTS OF AN ANODISED ALUMINIUM FRAME WITH A SUBMICRON CELLULOSE OR FLUROPOLYMER MEMBRANE. IT IS ATTACHED TO THE PHOTOMASK WITH PRE-ADDITIVE ADHESIVE USING A PRESSURISED PELLICLE MOUNTING TOOL. THEY ARE IMPORTED PACKAGED IN BESPOKE TWO PART MOULDED CASES MADE FROM SOFT OR HARD PLASTIC.