A HIGH PRECISION PLATE CONTAINING MICROSCOPIC IMAGES OF ELECTRONIC CIRCUITS. THE PHOTOMASK IS MADE FROM A VERY FLAT PIECE OF QUARTZ OR GLASS WITH A LAYER OF CHROME ON ONE SIDE. ETCHED IN THE CHROME IS A PORTION OF AN ELECTRONIC CIRCUIT. THE PHOTOMASK IS USED IN WAFER FABRICATION, MOSTLY TO MAKE IC'S (INTEGRATEDCIRCUITS). IC'S ARE USED IN MANY PRODUCTS LIKE COMPUTERS, CALCULATORS, CARS, CAMERAS, AND STEREOS. PHOTOMASKS ARE ALSO USED TO MAKE FLAT PANEL DISPLAYS, THIN FILM HEADS, PC BOARDS, ETC. THE DESIGN ON THE PHOTOMASK IS CREATED FROM DATA PROVIDED BY THE CUSTOMER.

CLASSIFICATION HAS BEEN DETERMINED IN ACCORDANCE WITH THE FOLLOWING:- GENERAL INTERPRETATIVE RULES (GIRS) GIR 1 HAS BEEN USED TO CLASSIFY THIS PRODUCT BY THE TERMS OF HEADING 3705 - PHOTOMASKS FOR PHOTOGRAPHICALLY TRANSFERRING CIRCUIT DIAGRAM PATTERNS ONTO SEMICONDUCTOR WAFERS. CN CODE - 37050090 - OTHER THAN ELSEWHERE SPECIFIED TARIC CODE 3705009010 - PHOTOMASKS FOR PHOTOGRAPHICALLY TRANSFERRING CIRCUIT DIAGRAM PATTERNS ONTO SEMICONDUCTOR WAFERS ALSO CLASSIFIED IN ACCORDANCE WITH HSENS TO 3705