Sensors and Lasers
e. Glass, including fused silica, phosphate glass, fluorophosphate glass, zirconium fluoride (ZrF4) (CAS 7783-64-4) and hafnium fluoride (HfF4) (CAS 13709-52-9) and having all of the following: 1. A hydroxyl ion (OH-) concentration of less than 5 ppm; 2. Integrated metallic purity levels of less than 1 ppm; and 3. High homogeneity (index of refraction variance) less than 5 x 10-6;
| Reference | Parameter | Threshold |
|---|---|---|
| 6C004 | 52-9) and having all of the following: 1. A hydroxyl ion (OH-) concentration of | < 5 ppm |
| 6C004 | 2. Integrated metallic purity levels of | < 1 ppm |
| 6C004 | and 3. High homogeneity (index of refraction variance) | < 5 x |
| 6C004.a.1 | A volume | > 100 cm |
| 6C004.a.2 | A diameter | > 80 mm and |
| 6C004.c.1 | and b. Response time of | < 1 ms |
| 6C004.d | > 300 mm in | |
| 6C004.e | of the following: 1. A hydroxyl ion (OH-) concentration of | < 5 ppm |
| 6C004.e | 2. Integrated metallic purity levels of | < 1 ppm |
| 6C004.f | with an absorption of less than 10^–5 cm^–1 for wavelengths | > 200 nm but |
6C004.aZinc selenide (ZnSe) and zinc sulphide (ZnS) "substrate blanks", produced by the chemical vapour deposition process and having any of the following:
6C004.a.1A volume greater than 100 cm^3; or
6C004.a.2A diameter greater than 80 mm and a thickness of 20 mm or more;
6C004.bElectro-optic materials and non-linear optical materials, as follows:
6C004.b.1Potassium titanyl arsenate (KTA) (CAS 59400-80-5);
6C004.b.2Silver gallium selenide (AgGaSe2, also known as AGSE) (CAS 12002-67-4);
6C004.b.3Thallium arsenic selenide (Tl3AsSe3, also known as TAS) (CAS 16142-89-5);
6C004.b.4Zinc germanium phosphide (ZnGeP2, also known as ZGP, zinc germanium biphosphide or zinc germanium diphosphide); or
6C004.b.5Gallium selenide (GaSe) (CAS 12024-11-2);
6C004.cNon-linear optical materials, other than those specified in 6C004.b., having any of the following:
6C004.c.1Having all of the following: a. Dynamic (also known as non-stationary) third order non-linear susceptibility (χ^(3), chi 3) of 10^–6 m^2/V^2 or more; and b. Response time of less than 1 ms; or
6C004.c.2Second order non-linear susceptibility (χ^(2), chi 2) of 3,3×10^–11 m/V or more;
6C004.d"Substrate blanks" of silicon carbide or beryllium beryllium (Be/Be) deposited materials, exceeding 300 mm in diameter or major axis length;
6C004.eGlass, including fused silica, phosphate glass, fluorophosphate glass, zirconium fluoride (ZrF4) (CAS 7783-64-4) and hafnium fluoride (HfF4) (CAS 13709-52-9) and having all of the following: 1. A hydroxyl ion (OH-) concentration of less than 5 ppm; 2. Integrated metallic purity levels of less than 1 ppm; and 3. High homogeneity (index of refraction variance) less than 5 × 10^–6;
6C004.fSynthetically produced diamond material with an absorption of less than 10^–5 cm^–1 for wavelengths exceeding 200 nm but not exceeding 14 000 nm.
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