Customs Search

A HIGH PRECISION PLATE CONTAINING MICROSCOPIC IMAGES OF ELECTRONIC CIRCUITS. THE PHOTOMASK IS MADE FROM A VERY FLAT PIECE OF QUARTZ OR GLASS WITH A LAYER OF CHROME ON ONE SIDE. ETCHED IN THE CHROME IS A PORTION OF AN ELECTRONIC CIRCUIT. THE PHOTOMASK IS USED IN WAFER FABRICATION, MOSTLY TO MAKE IC'S (INTEGRATEDCIRCUITS). IC'S ARE USED IN MANY PRODUCTS LIKE COMPUTERS, CALCULATORS, CARS, CAMERAS, AND STEREOS. PHOTOMASKS ARE ALSO USED TO MAKE FLAT PANEL DISPLAYS, THIN FILM HEADS, PC BOARDS, ETC. THE DESIGN ON THE PHOTOMASK IS CREATED FROM DATA PROVIDED BY THE CUSTOMER.

Please see Induction material attached describing the Maskmaking process and another document describing the Photomask itself. Values range from £100 to £10,000 depending on size, substrate and data complexity. The Photomasks are used by our Customers to Photographically transfer circuit diagram patterns onto Semiconductor wafers

PHOTOMASK BLANK. A PLATE, COVERED WITH A FILM OF CHROMIUM AND COATED WITH A PHOTOSENSITIVE OR ELECTRON-SENSITIVE RESIN.THE PLATE/BLANK IS IMAGED USING LASER WRITING TOOLS WITH BESPOKE CIRCUIT DIAGRAM PATTERNS, THEN PROCESSED USING DEVELOP AND ETCHANT TYPE CHEMICALS TO MAKE A PHOTOMASK.PACKAGING OF THE BLANKS INVOLVES LIGHT SENSITIVE MULTICARRIERS WHICH SIT INSIDE CUSHIONED CARDBOARD CONTAINERS OFTEN SHIPPED ON PALLETS TO PROTECT FROM EXCESS VIBRATION. THESE BLANKS ARE AVAILABLE IN SIZES FROM 3 INCHES TO 14 INCHES. THEY CAN BE MADE FROM QUARTZ OR SODA LIME GLASS.

SENSITISING PREPARATION, COMPRISING OF ACRYLATE AND/OR MATHACRYLATE POLYMERS, CONTAINING BY WEIGHT NOT MORE THAN 7% PHOTOSENSITIVE ACID PRECURSORS DISSOLVED IN AN ORGANIC SOLVENT CONTAINING AT LEAST 2-METHOXY-1METHYLETHYL ACETATE.

PHOTO RESIST USED IN THE PROCESS OF BUILDING COMPUTER CHIPS. THIS PRODUCT IS LIMITED TO USE AS A PHOTORESIST IN SEMICONDUCTOR PHOTOMICROLITHOGRAPHY. IT IS A COLOURLESS, ODORLESS LIQUID. CHEMICAL DESCRIPTION - 1-ETHOXY-2-PROPANOL