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HIGH STRENGTH GEOTEXTILE MADE FROM 100 PERCENT HIGH TENACITY POLYESTER. MANUFACTURED USING THE WEFT INSERTION PROCESS. THE LOAD BEARING YARNS ARE LAID ACROSS ONE ANOTHER AND THEN STITCH BONDED. FOR TECHNICAL USE IN THE REINFORCEMENT OF SOIL IN THE CONSTRUCTION OF STRUCTURES SUCH AS EMBANKMENTS.

SELF ADHESIVE POLISHING DISC USED TO POLISH WAFERS AS PART OF THE MANUFACTURING PROCESS INVOLVED IN THE PRODUCTION OF SEMICONDUCTOR WAFERS. THE DISC CONSISTS OF A POLYURETHANE IMPREGNATED FELT SUBSTRATE LAYER COATED WITH VARIOUS POLYMER FORMULATIONS AND IS SUPPLIED IN CIRCULAR SHAPES MEASURING 24" TO 36" IN DIAMETER.

SELF ADHESIVE POLISHING DISC USED TO POLISH WAFERS AS PART OF THE MANUFACTURING PROCESS INVOLVED IN THE PRODUCTION OF SEMICONDUCTOR WAFERS. THE DISC CONSISTS OF A POLYURETHANE IMPREGNATED FELT SUBSTRATE LAYER COATED WITH VARIOUS POLYMER FORMULATIONS. THE DISC IS SUPPLIED IN CIRCULAR SHAPES MEASURING 24" TO 36" IN DIAMETER.

SELF ADHESIVE POLISHING DISC USED TO POLISH WAFERS AS PART OF THE MANUFACTURING PROCESS INVOLVED IN THE PRODUCTION OF SEMICONDUCTOR WAFERS. THE DISC CONSISTS OF A MICRO POROUS POLYMER POLISH LAYER BONDED TO A POLYURETHANE IMPREGNATED FELT PAD AND IS SUPPLIED IN CIRCULAR SHAPES MEASURING 24" TO 36" IN DIAMETER.

ELECTROMAGNETIC INTERFERENCE AND RADIO FREQUENCY INTERFERENCE (EMI/RFI) SHIELDING GASKETS. MANUFACTURED FROM CONDUCTIVE POLYURETHANE FOAM WRAPPED IN NICKEL CLOTH. THE FABRICS IN THE COMPOSITE ARE POLYESTER OR NYLON YARN COATED WITH NICKEL/COPPER/NICKEL LAYER. THE FABRICS ARE WRAPPED AROUND FOAM, THE FOAM ENSURES GOOD ELECTRICAL CONTACT BETWEEN DIFFERENT PARTS OF A CIRCUIT OR ENCLOSURE. A PRESSURE RESTRICTIVE ADHESIVE TAPE IS APPLIED TO FIT THE PART IN PLACE INSIDE ELECTRONIC ENCLOSURES.