MASK BLANKS - HIGHLY POLISHED, HIGHLY FLAT GLASS OR SYNTHETIC QUARTZ SUBSTRATE, COATED WITH A THIN FILM OF CHROMIUM OR OTHER ABSORBING MATERIAL AND A PHOTORESIST OR ELECTRON-BEAM RESIST. THE RESIST IS SENSITISED BY UV OR ELECTRON-BEAM RADIATION IN PATTERNS RELATING TO INTEGRATED CIRCUIT DESIGN. SENSITISED RESIST IS DEVELOPED AND THE REVEALED FILM IS ETCHED. AFTER THE REMAINING RESIST IS REMOVED, A HIGH CONTRAST INTEGRATED CIRCUIT PATTERN OF FILM AND TRANSPARENT SUBSTRATE REMAINS. THE RESULTANT PHOTO-MASK IS USED FOR THE PRODUCTION OF SEMICONDUCTOR AND SIMILAR ELECTRONIC DEVICES

CLASSIFICATION IS DETERMINED IN ACCORDANCE WITH THE FOLLOWING: GIRS 1 HAS BEEN USED TO CLASSIFY TO HEADING 3701 FOR PHOTOGRAPHIC PLATES AND FILM IN THE FLAT, SENSITISED, UNEXPOSED, OF ANY MATERIAL OTHER THAN PAPER, PAPERBOARD OR TEXTILES; INSTANT PRINT FILM IN THE FLAT, SENSITISED, UNEXPOSED, WHETHER OR NOT IN PACKS CN CODE 37019900 FOR OTHER THAN COLOUR PHOTOGRAPHY. ALSO CLASSIFIED IN ACCORDANCE WITH HSENS TO 3701.