COMPACTS, WHICH ARE USED IN THE MANUFACTURE OF MICROELECTRONIC PRODUCTS. THE COMPACTS, WHICH ARE MADE OF ANTI-STATIC PLASTIC, ARE ESSENTIAL COMPONENTS USED FOR THE STORAGE OF PHOTOMASKS USED IN THE PHOTOLITHOGRAPHY PROCESS. THEY ARE DESIGNED FOR USE WITH SPECIFIC PHOTOMASKS AND ARE ESSENTIAL IN MAINTAINING THE CLEANLINESS AND QUALITY OF THE PHOTOMASK THROUGHOUT THE MANUFACTURING PROCESS.

CLASSIFICATION IS DETERMINED BY THE INTERPRETATION OF GENERAL RULES 1 & 6 OF THE COMBINED NOMENCLATURE AND THE TERMS OF HEADING 9010 AND SUBHEADING 901090. NOTE 2(b) TO CHAPTER 90.