A PHOTOMASK COMPACT. USED FOR THE HOUSING, STORAGE, HANDLING AND MOVEMENT OF A PHOTOMASK IN A PARTICLE FREE ENVIRONMENT INSIDE A PHOTOLITHOGRAPHY OR SEMICONDUCTOR FABRICATION FACILITY. MADE OF BLENDED THERMOPLASTICS PROVIDING SPECIAL ELECTROSTATIC DISCHARGE (ESD) AND OUTGASSING PROPERTIES. MATERIALS INCLUDE BUT ARE NOT LIMITED TO; CARBON FILLED POLYCARBONATE, ACRYLONITRILE BUTADIENE STYRENE (ABS) AND POLYPROPYLENE EACH HAVING NONPOROUS, ABRASION RESISTANT OR IMPACT RESISTANT SURFACE PROPERTIES. COMPACT CONTAINS SPECIALLY DESIGNED RETAINER SYSTEM TO PROTECT THE PHOTOMASK FROM SURFACE OR COSMETIC DAMAGE AND IS AVAILABLE EITHER WITH OR WITHOUT A GASKET SEAL.

CLASSIFICATION HAS BEEN DETERMINED IN ACCORDANCE WITH THE FOLLOWING:- GENERAL INTERPRETATIVE RULES (GIRs) GIR 1 HAS BEEN USED TO CLASSIFY THIS PRODUCT BY THE TERMS OF HEADING 3923 - ARTICLES FOR THE CONVEYANCE OR PACKING OF GOODS, OF PLASTICS; STOPPERS, LIDS, CAPS AND OTHER CLOSURES, OF PLASTICS GIR 6 HAS BEEN USED TO CLASSIFY THE GOODS TO SUBHEADING LEVEL 392310 - BOXES, CASES, CRATES AND SIMILAR ARTICLES TARIC CODE 3923109010 - PHOTOMASK OR WAFER COMPACTS: - CONSISTING OF ANTISTATIC MATERIALS OR BLENDED THERMOPLASTICS PROVING SPECIAL ELECTROSTATIC DISCHARGE (ESD) AND OUTGASSING PROPERTIES, - HAVING NON POROUS, ABRASION RESISTANT OR IMPACT RESISTANT SURFACE PROPERTIES, - FITTED WITH A SPECIALLY DESIGNED RETAINER SYSTEM THAT PROTECTS THE PHOTOMASK OR WAFERS FROM SURFACE OR COSMETIC DAMAGE AND - WITH OR WITHOUT A GASKET SEAL, OF A KIND USED IN THE PHOTOLITHOGRAPHY OR OTHER SEMICONDUCTOR PRODUCTION TO HOUSE PHOTOMASKS OR WAFERS ALSO CLASSIFIED IN ACCORDANCE WITH CHAPTER NOTE 1 TO CHAPTER 39 HSENs TO 3923