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2E003

Traitement des matériaux

Catégorie 2Groupe EWassenaar Arrangement

Description

Cette entrée contrôle la technologie utilisée pour appliquer des revêtements inorganiques ou des modifications de surface inorganiques sur des substrats non électroniques, par des procédés avancés comme la déposition chimique en phase vapeur (CVD), la déposition physique en phase vapeur (PVD), la pulvérisation cathodique, ou la déposition par faisceau d’électrons. Ces technologies sont essentielles pour la fabrication de pièces à haute performance, notamment dans l’aéronautique, l’automobile ou l’outillage, afin d’améliorer la résistance à l’usure, à la corrosion ou à la chaleur.

Sous-entrees (12)

2E003.b

For Thermal Evaporation-Physical Vapour Deposition (TE-PVD):

2E003.g

For Ion Plating:

2E003.a

Not used;

2E003.b.1

"Technology" for the design of tools, dies or fixtures specially designed for any of the following processes:

2E003.b.1.a

"Superplastic forming";

2E003.b.1.b

"Diffusion bonding"; or

2E003.b.1.c

‘Direct-acting hydraulic pressing’;

2E003.b.2

Not used;

2E003.c

"Technology" for the "development" or "production" of hydraulic stretch-forming machines and dies therefor, for the manufacture of airframe structures;

2E003.d

Not used;

2E003.e

"Technology" for the "development" of integration "software" for incorporation of expert systems for advanced decision support of shop floor operations into "numerical control" units;

2E003.f

"Technology" for the application of inorganic overlay coatings or inorganic surface modification coatings (specified in column 3 of the following table) to non-electronic substrates (specified in column 2 of the following table), by processes specified in column 1 of the following table and defined in the Technical Note.

Exemples de produits

Procédures de dépôt CVD pour revêtements en carbure de tungstène sur outils Sandvik Coromant
Manuels techniques pour la déposition PVD sur pièces de turbines Rolls-Royce
Instructions de dépôt de couches de diamant sur fenêtres optiques Thorlabs
Procédés de revêtement céramique sur pistons Mahle
Méthodes de traitement de surface pour matrices de formage FIBRO

Codes douaniers CN associes (indicatif)

82077031 69091900 84804900 85059080

Notes

-N.B. This Table should be read to specify the "technology" for a particular 'Coating Process' only when the Resultant Coating in column 3 is in a paragraph directly across from the relevant 'Substrate' under column 2. For example, Chemical Vapour Deposition (CVD) 'coating process' technical data are included for the application of 'silicides' to 'Carbon-carbon, Ceramic and Metal "matrix" "composites"' substrates, but are not included for the application of 'silicides' to 'Cemented tungsten carbide (16), Silicon carbide (18)' substrates. In the second case, the resultant coating is not listed in the paragraph under column 3 directly across from the paragraph under column 2 listing 'Cemented tungsten carbide (16), Silicon carbide (18)'.
-N.B.1. CVD includes the following processes: directed gas flow out-of-pack deposition, pulsating CVD, Controlled Nucleation Thermal Deposition (CNTD), plasma enhanced or plasma assisted CVD processes.
-N.B.2. Pack denotes a substrate immersed in a powder mixture.
-N.B.3. The gaseous reactants used in the out-of-pack process are produced using the same basic reactions and parameters as the pack cementation process, except that the substrate to be coated is not in contact with the powder mixture.
-N.B. This definition does not include random cathodic arc deposition with non-biased substrates.
-N.B.1. Low pressure means less than ambient atmospheric pressure.
-N.B.2. High velocity refers to nozzle-exit gas velocity exceeding 750 m/s calculated at 293 K (20°C) at 0.1 MPa.
-N.B.1. The Table refers only to triode, magnetron or reactive sputter deposition which is used to increase adhesion of the coating and rate of deposition and to radio frequency (RF) augmented sputter deposition used to permit vaporisation of non-metallic coating materials.
-N.B.2. Low-energy ion beams (less than 5 keV) can be used to activate the deposition.

Notes applicables

Note Générale sur la Technologie (NGT)

L'exportation de 'technologie' 'nécessaire' au 'développement', à la 'production' ou à l''utilisation' d'articles contrôlés dans les catégories 0 à 9 est contrôlée conformément aux dispositions de cha...

Note Générale sur les Logiciels (NGL)

Les Listes ne contrôlent pas les 'logiciels' qui sont : 1. Généralement accessibles au public du fait qu'ils sont : a. Vendus sans restriction à partir de points de vente au détail, par l'un des moyen...

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Voir aussi

Nomenclature douanière

25 000+ codes

Guide de classement

1 095 HS4

Sous-entrees (12)

2E003.b

For Thermal Evaporation-Physical Vapour Deposition (TE-PVD):

2E003.g

For Ion Plating:

2E003.a

Not used;

2E003.b.1

"Technology" for the design of tools, dies or fixtures specially designed for any of the following processes:

2E003.b.1.a

"Superplastic forming";

2E003.b.1.b

"Diffusion bonding"; or

2E003.b.1.c

‘Direct-acting hydraulic pressing’;

2E003.b.2

Not used;

2E003.c

"Technology" for the "development" or "production" of hydraulic stretch-forming machines and dies therefor, for the manufacture of airframe structures;

2E003.d

Not used;

2E003.e

"Technology" for the "development" of integration "software" for incorporation of expert systems for advanced decision support of shop floor operations into "numerical control" units;

2E003.f

Exemples de produits

Procédures de dépôt CVD pour revêtements en carbure de tungstène sur outils Sandvik Coromant
Manuels techniques pour la déposition PVD sur pièces de turbines Rolls-Royce
Instructions de dépôt de couches de diamant sur fenêtres optiques Thorlabs
Procédés de revêtement céramique sur pistons Mahle
Méthodes de traitement de surface pour matrices de formage FIBRO

Codes douaniers CN associes (indicatif)

82077031 69091900 84804900 85059080

Notes

-N.B. This Table should be read to specify the "technology" for a particular 'Coating Process' only when the Resultant Coating in column 3 is in a paragraph directly across from the relevant 'Substrate' under column 2. For example, Chemical Vapour Deposition (CVD) 'coating process' technical data are included for the application of 'silicides' to 'Carbon-carbon, Ceramic and Metal "matrix" "composites"' substrates, but are not included for the application of 'silicides' to 'Cemented tungsten carbide (16), Silicon carbide (18)' substrates. In the second case, the resultant coating is not listed in the paragraph under column 3 directly across from the paragraph under column 2 listing 'Cemented tungsten carbide (16), Silicon carbide (18)'.
-N.B.1. CVD includes the following processes: directed gas flow out-of-pack deposition, pulsating CVD, Controlled Nucleation Thermal Deposition (CNTD), plasma enhanced or plasma assisted CVD processes.
-N.B.2. Pack denotes a substrate immersed in a powder mixture.
-N.B.3. The gaseous reactants used in the out-of-pack process are produced using the same basic reactions and parameters as the pack cementation process, except that the substrate to be coated is not in contact with the powder mixture.
-N.B. This definition does not include random cathodic arc deposition with non-biased substrates.
-N.B.1. Low pressure means less than ambient atmospheric pressure.
-N.B.2. High velocity refers to nozzle-exit gas velocity exceeding 750 m/s calculated at 293 K (20°C) at 0.1 MPa.
-N.B.1. The Table refers only to triode, magnetron or reactive sputter deposition which is used to increase adhesion of the coating and rate of deposition and to radio frequency (RF) augmented sputter deposition used to permit vaporisation of non-metallic coating materials.
-N.B.2. Low-energy ion beams (less than 5 keV) can be used to activate the deposition.

Notes applicables

Note Générale sur la Technologie (NGT)

Note Générale sur les Logiciels (NGL)