40 ECN entries
Category 3 covers advanced electronic components and test equipment: integrated circuits (3A001), FPGAs, analog-to-digital converters, power transistors, oscilloscopes and spectrum analyzers (3A002), semiconductor manufacturing equipment (3B001). Thresholds target frequency, resolution, settling time, and logic gate count. A key category for China restrictions (advanced chips, lithography).
3A001Wassenaar Arrangement (WA)208 thresholdsElectronic components, as follows:
175 sub-entries
3A002Wassenaar Arrangement (WA)77 thresholdsGeneral purpose electronic equipment, as follows:
48 sub-entries
3A003Wassenaar ArrangementSpray cooling thermal management systems employing closed loop fluid handling and reconditioning equipment in a sealed enclosure where a dielectric fluid is sprayed onto electronic components using specially designed spray nozzles that are designed to maintain electronic components within their operating temperature range, and specially designed components therefor.
3A101MTCRElectronic equipment, devices and components, other than those specified in 3A001, as follows:
2 sub-entries
3A102MTCR‘Thermal batteries’ designed or modified for ‘missiles’.
3A201Nuclear Suppliers Group11 thresholdsElectronic components, other than those specified in 3A001, as follows;
7 sub-entries
3A225Nuclear Suppliers GroupFrequency changers or generators, other than those specified in 0B001.b.13., usable as a variable or fixed frequency motor drive, having all of the following characteristics: a. Multiphase output providing a power of 40 VA or greater; b. Operating at a frequency of 600 Hz or more; and c. Frequency control better (less) than 0,2 %.
3A226Nuclear Suppliers GroupHigh-power direct current power supplies, other than those specified in 0B001.j.6., having both of the following characteristics: a. Capable of continuously producing, over a time period of 8 hours, 100 V or greater with current output of 500 A or greater; and b. Current or voltage stability better than 0,1 % over a time period of 8 hours.
3A227Nuclear Suppliers GroupHigh-voltage direct current power supplies, other than those specified in 0B001.j.5., having both of the following characteristics: a. Capable of continuously producing, over a time period of 8 hours, 20 kV or greater with current output of 1 A or greater; and b. Current or voltage stability better than 0,1 % over a time period of 8 hours.
3A228Nuclear Suppliers Group1 thresholdsSwitching devices, as follows:
3 sub-entries
3A229Nuclear Suppliers Group10 thresholdsHigh-current pulse generators as follows:
3 sub-entries
3A230Nuclear Suppliers Group3 thresholdsHigh-speed pulse generators, and ‘pulse heads’ therefor, having both of the following characteristics: a. Output voltage greater than 6 V into a resistive load of less than 55 ohms; and b. ‘Pulse transition time’ less than 500 ps.
3A231Nuclear Suppliers GroupNeutron generator systems, including tubes, having both of the following characteristics: a. Designed for operation without an external vacuum system; and b. Utilising any of the following: 1. Electrostatic acceleration to induce a tritium-deuterium nuclear reaction; or 2. Electrostatic acceleration to induce a deuterium-deuterium nuclear reaction and capable of an output of 3 × 10^9 neutrons/s or greater.
3A232Nuclear Suppliers Group1 thresholdsMultipoint initiation systems, other than those specified in 1A007, as follows:
2 sub-entries
3A233Nuclear Suppliers GroupMass spectrometers, other than those specified in 0B002.g., capable of measuring ions of 230 u or greater and having a resolution of better than 2 parts in 230, as follows, and ion sources therefor:
6 sub-entries
3A234Nuclear Suppliers Group2 thresholdsStriplines to provide low inductance path to detonators with the following characteristics: a. Voltage rating greater than 2 kV; and b. Inductance of less than 20 nH.
3B001Wassenaar Arrangement4 thresholdsj. Mask "substrate blanks" with multilayer reflector structure consisting of molybdenum and silicon, and having all of the following: 1. Specially designed for 'Extreme Ultraviolet' ('EUV') lithography; and 2. Compliant with SEMI Standard P37.
23 sub-entries
3B002Wassenaar ArrangementTest equipment specially designed for testing finished or unfinished semiconductor devices as follows and specially designed components and accessories therefor:
3 sub-entries
3C001Wassenaar ArrangementHetero-epitaxial materials consisting of a "substrate" having stacked epitaxially grown multiple layers of any of the following:
6 sub-entries
3C002Wassenaar Arrangement5 thresholdsb. All resists designed for use with electron beams or ion beams, with a sensitivity of 0.01 µcoulomb/mm2 or better;
7 sub-entries
3C003Wassenaar ArrangementOrgano-inorganic compounds as follows:
2 sub-entries
3C004Wassenaar ArrangementHydrides of phosphorus, arsenic or antimony, having a purity greater (better) than 99.999%, even diluted in inert gases or hydrogen.
3C005Wassenaar Arrangement2 thresholdsHigh resistivity materials as follows:
2 sub-entries
3C006Wassenaar ArrangementMaterials, not specified in 3.C.1., consisting of a "substrate" specified in 3.C.5. with at least one epitaxial layer of silicon carbide, gallium nitride, aluminium nitride, aluminium gallium nitride, gallium oxide (Ga2O3) or diamond.
3D001Wassenaar Arrangement"Software" specially designed for the "development" or "production" of equipment specified in 3.A.1.b. to 3.A.2.h. or 3.B.
3D002Wassenaar Arrangement"Software" specially designed for the "use" of equipment specified in 3.B.1.a. to 3.B.1.f. or 3.B.2.
3D003Wassenaar Arrangement'Computational lithography' "software" specially designed for the "development" of patterns on EUV-lithography masks or reticles.
3D004Wassenaar Arrangement"Software" specially designed for the "development" of equipment specified in 3.A.3.
3D005Wassenaar Arrangement"Software" specially designed to restore normal operation of a microcomputer, "microprocessor microcircuit" or "microcomputer microcircuit" within 1 ms after an Electromagnetic Pulse (EMP) or Electrostatic Discharge (ESD) disruption, without loss of continuation of operation.
3D006Wassenaar Arrangement'Electronic Computer-Aided Design' ('ECAD') "software" specially designed for the "development" of integrated circuits having any "Gate-All-Around Field-Effect Transistor" ("GAAFET") structure, and having any of the following:
2 sub-entries
3D101MTCR"Software" specially designed or modified for the "use" of equipment specified in 3A101.b.
3D225Nuclear Suppliers Group"Software" specially designed to enhance or release the performance of frequency changers or generators to meet the characteristics of 3A225.
3E001Wassenaar Arrangement"Technology" according to the General Technology Note for the "development" or "production" of equipment or materials specified in 3.A.1., 3.A.2., 3.B. or 3.C.
3E002Wassenaar Arrangement"Technology" according to the General Technology Note other than that specified in 3.E.1. for the "development" or "production" of a "microprocessor microcircuit", "microcomputer microcircuit" or microcontroller microcircuit core, having an Arithmetic Logic Unit (ALU) with an access width of 32 bits or more and any of the following features or characteristics:
4 sub-entries
3E003Wassenaar Arrangementc. "Superconductive" electronic devices;
8 sub-entries
3E004Wassenaar Arrangement"Technology" "required" for the slicing, grinding and polishing of 300 mm diameter silicon wafers to achieve a 'Site Front least sQuares Range' ('SFQR') less than or equal to 20 nm at any site of 26 mm x 8 mm on the front surface of the wafer and an edge exclusion less than or equal to 2 mm.
3E101MTCR"Technology" according to the General Technology Note for the "use" of equipment or "software" specified in 3A001.a.1. or 2., 3A101, 3A102 or 3D101.
3E102MTCR"Technology" according to the General Technology Note for the "development" of "software" specified in 3D101.
3E201Nuclear Suppliers Group"Technology" according to the General Technology Note for the "use" of equipment specified in 3A001.e.2., 3A001.e.3., 3A001.g., 3A201, 3A225 to 3A234.
3E225Nuclear Suppliers Group"Technology", in the form of codes or keys, to enhance or release the performance of frequency changers or generators to meet the characteristics of 3A225.